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Your search for "sp consulting china tantalum nitride thin film market research report forecast 2017 2022" gave back 423955 results.
Titanium nitride target is used in PVD processes to deposit titanium nitride thin films. Titanium nitride films are known for their hardness, wear...
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MRRPB5
November 2023
Price: USD 3,350.00
Silicon nitride target is a material used in PVD techniques to produce silicon nitride thin films. Silicon nitride films have applications in the...
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MRRPB5
November 2023
Price: USD 3,350.00
Titanium nitride target is used in PVD processes to deposit titanium nitride thin films. Titanium nitride films are known for their hardness, wear...
Catalog:
MRRPB5
February 2024
Price: USD 2,900.00
Silicon nitride target is a material used in PVD techniques to produce silicon nitride thin films. Silicon nitride films have applications in the...
Catalog:
MRRPB5
February 2024
Price: USD 2,900.00
Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be...
Catalog:
LPI
March 2023
Price: USD 3,660.00
Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be...
Catalog:
MRRPB5
March 2023
Price: USD 2,900.00
Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be...
Catalog:
MRRPB5
March 2023
Price: USD 4,900.00
Pulsed laser deposition is a method that uses high power pulsed laser to evaporate materials and form thin films on the substrate. This technology...
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MRRPB5
September 2023
Price: USD 2,900.00
The global Industrial Vacuum Chamber market is projected to reach US$ million in 2029, increasing from US$ million in 2022, with the CAGR of % during...
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MRRPB5
October 2023
Price: USD 2,900.00
An iron oxide target is a specialized material used in the production of thin films through physical vapor deposition (PVD) techniques. Iron oxide...
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MRRPB5
November 2023
Price: USD 3,350.00
An iron oxide target is a specialized material used in the production of thin films through physical vapor deposition (PVD) techniques. Iron oxide...
Catalog:
MRRPB5
February 2024
Price: USD 2,900.00
The global Thin-Film Measurement Systems market is projected to reach US$ 1801 million in 2029, increasing from US$ 803 million in 2022, with the...
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MRRPB5
September 2023
Price: USD 2,900.00
Titanium Nitride Sputtering Targets are commonly used in semiconductors, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
Catalog:
LPI
March 2023
Price: USD 3,660.00
Titanium Nitride Sputtering Targets are commonly used in semiconductors, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
Catalog:
MRRPB5
March 2023
Price: USD 2,900.00
Titanium Nitride Sputtering Targets are commonly used in semiconductors, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
Catalog:
MRRPB5
March 2023
Price: USD 4,900.00
