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Titanium Nitride Sputtering Targets are commonly used in semiconductors, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
Catalog:
LPI
March 2023
Price: USD 3,660.00
Iron Oxide (Fe3O4) Sputtering Targets are used as a material for high-density magnetic storage, pigments, and catalysts in styrene synthesis. The “...
Catalog:
LPI
March 2023
Price: USD 3,660.00
Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be...
Catalog:
LPI
March 2023
Price: USD 3,660.00
The global Zero Carbon Factory market size is expected to reach $ million by 2030, rising at a market growth of % CAGR during the forecast period (...
Catalog:
GIR
March 2024
Price: USD 4,480.00
An easy-to-carry, foldable solar panel, usually for outdoor use, and can also be used for outdoor power charging The global Portable Solar Folding...
Catalog:
MRRPB5
October 2023
Price: USD 2,900.00
As the global economy recovers in 2021 and the supply of the industrial chain improves, the Medical Mock Survey market will undergo major changes...
Catalog:
Arsta
July 2022
Price: USD 3,360.00
The global Zero Carbon Factory market size was valued at USD million in 2023 and is forecast to a readjusted size of USD million by 2030 with a CAGR...
Catalog:
GIR
March 2024
Price: USD 3,480.00
The global Zero Carbon Buildings market size was valued at USD million in 2022 and is forecast to a readjusted size of USD million by 2029 with a...
Catalog:
GIR
October 2023
Price: USD 3,480.00
Iron Oxide (Fe3O4) Sputtering Targets are used as a material for high-density magnetic storage, pigments, and catalysts in styrene synthesis. The...
Catalog:
MRRPB5
March 2023
Price: USD 2,900.00
Chromium (Cr) Sputtering Targets is a pure metal target, widely used in electronics, semiconductor and flat panel displays applications. The global...
Catalog:
MRRPB5
March 2023
Price: USD 2,900.00
Titanium Nitride Sputtering Targets are commonly used in semiconductors, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
Catalog:
MRRPB5
March 2023
Price: USD 2,900.00
Si3N4 is prepared by heating powdered silicon between 1300 °C and 1400 °C in an atmosphere of nitrogen. Then the powder of silicon nitride can be...
Catalog:
MRRPB5
March 2023
Price: USD 2,900.00
Chrome oxide target is used in PVD techniques to deposit chrome oxide thin films. Chrome oxide films have applications in optics, corrosion...
Catalog:
MRRPB5
February 2024
Price: USD 2,900.00
Titanium nitride target is used in PVD processes to deposit titanium nitride thin films. Titanium nitride films are known for their hardness, wear...
Catalog:
MRRPB5
February 2024
Price: USD 2,900.00
An iron oxide target is a specialized material used in the production of thin films through physical vapor deposition (PVD) techniques. Iron oxide...
Catalog:
MRRPB5
February 2024
Price: USD 2,900.00
