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Aluminum Copper Tungsten Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display...
LPI
March 2023
Price: USD 3,660.00
Magnesium Zinc Oxide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
LPI
March 2023
Price: USD 3,660.00
Tungsten Boride Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
LPI
March 2023
Price: USD 3,660.00
Magnesium Sulfide Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
LPI
March 2023
Price: USD 3,660.00
Metalorganic vapour-phase epitaxy (MOVPE), also known as organometallic vapour-phase epitaxy (OMVPE) or metalorganic chemical vapour deposition (...
LPI
January 2023
Price: USD 3,660.00
Physical vapor deposition (PVD), sometimes (especially in single-crystal growth contexts) called physical vapor transport (PVT), describes a variety...
Catalog: 
MRRPB5
February 2024
Price: USD 2,900.00
Metalorganic vapour-phase epitaxy (MOVPE), also known as organometallic vapour-phase epitaxy (OMVPE) or metalorganic chemical vapour deposition (...
Catalog: 
LPI
February 2023
Price: USD 3,660.00
Thin film semiconductor deposition is a next-gen technology and is achieving rapid acceptance across various industries.Range of applications of thin...
Catalog: 
LPI
February 2023
Price: USD 3,660.00
The global Indium Evaporation Material market size was valued at USD million in 2022 and is forecast to a readjusted size of USD million by 2029 with...
GIR
August 2023
Price: USD 3,480.00
The global High Purity Indium Evaporation Material market size was valued at USD million in 2022 and is forecast to a readjusted size of USD million...
GIR
August 2023
Price: USD 3,480.00
Thin film deposition is the process of creating and depositing thin film coatings onto a substrate material. These coatings can be made of many...
Catalog: 
LPI
February 2023
Price: USD 3,660.00
Cobalt Oxide (CoO) Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
LPI
March 2023
Price: USD 3,660.00
Beryllium Oxide Sputtering Target has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
LPI
March 2023
Price: USD 3,660.00
Aluminium Boride Sputtering Targets has the highest possible density and the smallest possible average grain size for semiconductor, chemical vapor...
LPI
March 2023
Price: USD 3,660.00
Nickel Platinum Sputtering Target can be use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and...
LPI
March 2023
Price: USD 3,660.00

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