Global CoFeB Sputtering Target Market Strategic Research Report

Scope of the Report

The global CoFeB Sputtering Target market size is predicted to grow from US$ 959 million in 2025 to US$ 1,834 million in 2032; it is expected to grow at a CAGR of 9.8% from 2026 to 2032.

A CoFeB sputtering target is a functional thin-film deposition material composed of cobalt (Co), iron (Fe), and boron (B). It is used in physical vapor deposition (PVD), particularly magnetron sputtering processes, to deposit CoFeB thin films onto substrates. These films exhibit excellent magnetic properties such as high spin polarization, low coercivity, and strong perpendicular magnetic anisotropy, making them essential in advanced spintronic devices including magnetic tunnel junctions (MTJs), MRAM, and magnetic sensors.In 2025, global CoFeB sputtering target production reached approximately 136 MT, with an average global market price of around US$ 7200 per kg. Annual production capacity is 154 MT. Gross Profit Margin: 38%.The CoFeB sputtering target industry chain is highly concentrated and technology-driven. Upstream consists of high-purity metal suppliers of cobalt, iron, and boron, along with advanced alloy processing equipment and vacuum metallurgy technologies. Midstream is dominated by precision manufacturers that perform alloy design, vacuum melting, HIP densification, machining, and bonding to produce finished sputtering targets. Downstream applications are primarily in MRAM, magnetic sensors, spintronic devices, and advanced semiconductor memory, where CoFeB is a critical functional thin-film material used in magnetic tunnel junction (MTJ) structures. CoFeB sputtering targets represent a high-value, performance-critical niche within advanced semiconductor materials rather than a commodity metal product. Their value is driven not by raw material cost but by composition precision, microstructural control, and process stability. As MRAM and spintronic technologies gradually scale, demand is expected to grow steadily, but supply will likely remain concentrated among a few global players with strong metallurgical and semiconductor integration capabilities.

Global key CoFeB Sputtering Target players cover Jx Nippon Mining & Metals Corporation（Japan）, Tosoh Corporation（Japan）, Materion Corporation(United States), Plansee Se(Germany), Mitsui Mining And Smelting （Japan）, etc.

Key Questions Addressed in this Report

What is the 10-year outlook for the global CoFeB Sputtering Target market?

What factors are driving CoFeB Sputtering Target market growth, globally and by region?

Which technologies are poised for the fastest growth by market and region?

How do CoFeB Sputtering Target market opportunities vary by end market size?

How does CoFeB Sputtering Target break out by Composition Ratio, by Application?

This report presents a comprehensive overview of the global CoFeB Sputtering Target market, covering market size and forecast, segmentation by product type and application, competitive landscape, leading players and regional and country-level outlook.

Segment by Composition Ratio

• Standard Stoichiometric CoFeB Target
• Co-rich CoFeB Target
• Fe-rich CoFeB Target
• Low-Boron CoFeB Target
• High-Boron CoFeB Target

Segment by Manufacturing Process

• Vacuum Melted CoFeB Target
• Powder Metallurgy CoFeB Target
• Hot Isostatic Pressed (HIP) Target
• Cold Pressed & Sintered Target

Segment by Purity Level

• Standard Purity (≥99.5%)
• High Purity (≥99.9%)
• Ultra-High Purity (≥99.99%)

Segment by Application

• Semiconductor & Electronics
• Research & Development
• Others

Who Can Use This Report?

This report is written for decision-makers who need a clear, data-backed view of the global CoFeB Sputtering Target market:

• Manufacturers, suppliers and solution providers benchmarking their position and planning product, capacity and go-to-market strategy
• Distributors, channel partners and end users in Semiconductor & Electronics, Research & Development, Others evaluating demand and sourcing options
• Investors, financial analysts and consultants assessing growth opportunities, competitive dynamics and M&A potential
• Government agencies, industry associations and research institutions tracking industry developments and policy impact